FT-中国首台DUV光刻机测试

SMICtestsdomestically made machinery asBeijingseekstorivalUS-madeprocessors中芯国际测试国产设备北京寻求挑战美国制造的处理器 ©FTmontage/Dreamstime 吴子静（香港）与埃莉诺·奥科特（上海） 6 Published已发布2hoursago Stayinformedwithfreeupdates获取免费更新以保持信息通畅 Simplysignup totheArtificialintelligencemyFT Digest--delivereddirectly toyourinbox.只需注册“人工智能myFT摘要”——直接发送到您的收件箱。 China’sleading chip producer isrunning trials on the country’s firstdomesticallyproduced advanced chipmaking equipment inan effort tochallengewestern rivals inproducing artificialintelligence processors. 中国领先的芯片制造商正在试验国内首台先进芯片制造设备，力图在生产人工智能处理器方面挑战西方竞争对手。 SemiconductorManufacturing International Corporation(SMIC)istestingadeep-ultraviolet(DUV)lithography machine made by Yuliangsheng,aShanghai-basedstart-up,said two people with knowledge ofthe development. 两位知情人士表示，半导体制造国际公司（SMIC）正在测试由总部位于上海的初创公司Yuliangsheng制造的深紫外（DUV）光刻机。 Theability toproduce advanced DUV machines would represent abig victoryinChina’s ability toovercome US controls on chip export,reduce reliance onwesterntechnology and increase the production capacity ofadvanced AIprocessors. 具备生产先进DUV设备的能力将是中国在克服美国对芯片出口管制、减少对西方技术依赖并提高先进AI处理器产能方面的一项重大胜利。 LinQingyuan,semiconductor analyst atBernstein,said:“Ifsuccessful,itwouldrepresentan important step forChinese companies,which could build on thisbreakthroughformore advanced machinery.” 伯恩斯坦的半导体分析师林庆远表示：“如果成功，这将是中国公司迈出的重要一步，并可在这一突破基础上研发更先进的设备。” Todate,SMIC and Chinese chipmakers have relied on devices built byASML,thedominant Dutch maker ofadvanced lithographic equipment,but access tonewmachines has been limited byUS export controls over recent years.Chinesechip equipment maker Shanghai Micro Electronics Equipment makes less-advancedDUV machines. 到目前为止，中芯国际和中国其他芯片制造商一直依赖荷兰主导的先进光刻设备制造商ASML的设备，但近年来由于美国出口管制，新机器的获取受到限制。中国的芯片设备制造商上海微电子设备公司生产较不先进的DUV机器。 Chinaalso continues tolack access tothe best available chipmaking tools—extremeultraviolet photolithography machines(EUV)used tomake the mostcutting-edgechips forcompanies such asNvidia.ASML isbanned from sellingEUVequipment toChina. 中国仍然无法获得最先进的芯片制造工具——用于为英伟达等公司制造最前沿芯片的极紫外光刻机（EUV）。ASML被禁止向中国出售EUV设备。 China’sDUV effort has challenges toovercome.While the majority ofitscomponentsinYuliangsheng’s machine are made domestically,some parts aresourcedfrom abroad,said those with knowledge ofthe effort.But they addedthecompany ismaking efforts tomake allparts inthe country soon. 中国的DUV努力面临需克服的挑战。知情人士表示，誉良盛机器的大部分组件都是国内制造，但一些零部件仍从海外采购。不过，他们补充说，该公司正努力尽快在国内生产所有零部件。 Whileearly results from the SMIC trialare promising,itremains unclear ifandwhenthe machine can be used formass chip production,one ofthe peoplesaid. 虽然中芯试验的早期结果令人鼓舞，但其中一位人士表示，目前仍不清楚该设备是否以及何时能够用于大规模芯片生产。 Ittypicallytakes atleast ayear fornew DUV tools tobeadjusted many times inordertoreach the stability and yields—the percentage offunctional chipsmadeon itsmanufacturing line—that make them viable for use inproduction. 通常需要至少一年的时间对新的DUV设备进行多次调试，才能达到使其可用于量产的稳定性和良率——即在其生产线上制造出的可用芯片的百分比。 Themachines being tested use so-called immersion technology,similar tothatemployedby ASML,said people with knowledge ofthe effort. 知情人士表示，被测试的设备使用所谓的浸没式技术，类似于ASML所采用的技术。 Chinesechipmakers relyon ASML’s DUV machines,most ofthem boughtbeforethe US-led export controls or second hand from other countries,toproducethe country’s most advanced processors such asHuawei’s Ascendseries. 中国芯片制造商依赖ASML的DUV设备（大多数是在美国主导的出口管制之前购买，或从其他国家购得的二手设备）来生产该国最先进的处理器，例如华为的昇腾系列。 SMICistesting a28 nanometre(nm)Chinese-made DUV lithography machineandthen utilising so-called“multi-patterning techniques”toproduce 7nmchips,said two people with knowledge ofthe development.In industryparlance,“nanometres”refer toeach new generation ofchip,rather thanasemiconductor’sphysical dimensions. 两位知情人士称，SMIC正在测试一台28纳米（nm）国产DUV光刻机，然后利用所谓的“多重图案化技术”来制造7nm芯片。在业界说法中，“纳米”指的是每一代新的芯片工艺，而非半导体的物理尺寸。 Machinessuch asthe ones SMIC istrialling could also be pushed toproduce5nmprocessors at alower yield,but not any more advanced products. 像中芯国际正在试验的这些机器也可以被推动去生产良率较低的5纳米处理器，但无法制造更先进的产品。 Bycontrast,Taiwan Semiconductor Manufacturing Corporation(TSMC)willstartmass-producing cutting-edge 2nm chips using ASML’s latestEUVequipmentlater thisyear. 相比之下，台积电将于今年晚些时候使用ASML最新的EUV设备开始量产尖端的2纳米芯片。 EUVremains the more challenging bottleneck to overcome in order toproducethechips that can take on market leader Nvidia. EUV仍然是更难以突破的瓶颈，要想生产能够与市场领导者Nvidia抗衡的芯片必须克服这一点。 Shenzhen-basedSiCarrier,listed as Yuliangsheng’s shareholder on companyregistry,isamong companies dedicating resources tomaking EUV machines,butthese efforts remains inthe early stages,according tothe people. 据这些人士称，注册资料显示为玉良晟股东的深圳公司SiCarrier是投入资源制造EUV设备的公司之一，但这些努力仍处于早期阶段。 SiCarrier,founded in2021,unveiledalargefleet ofadvanced chipmanufacturingequipment tochallengecompaniessuch as Tokyo Electron andAppliedMaterials,atthe ShanghaiSemiconConference inMarch.Itsequipmentlines are named after China’sbiggestmountains such asWuyi andEmei. Recommended推荐 SemiconductorsNewsin-depth 半导体深度报道 SiCarrier成立于202