AI智能总结
英諾賽科(蘇州)科技股份有限公司InnoScience (Suzhou) Technology Holding Co., Ltd.(於中華人民共和國註冊成立的股份有限公司)股份代號: 2577 美好未來攜手共創 年 度 報 告2024 268202410111327355172758182848586 1.0015SonJay Hyung SonLuoWeiwei LuoLuoLuoInno HKInno Investment (Hong Kong) LimitedInno HoldingInnoScience Holding Pte. Ltd.LuoSon55.38%44.62%2020119 InnoScience (Suzhou) Technology Holding Co., Ltd. Weiwei LuoJay Hyung Son Weiwei Luo 98 24840 H1617 Weiwei Luo 2577 Weiwei Luo 188262602 https://www.innoscience.com 108 920 88 27 79 13662805 2024 1. •828.539.8%•2023-61.1%2024-19.5%41.6 2.AI •48.0%•986.7%•AI48V12VAI669.8%•150V/100V100W 3. •3.0(Chip/Wafer)30%• 2024 (15-200V)GPUAI1,200V97%50471 4.202495%40% 126.4118.1% 5. 6.6.6 1 20248(GaN)IDM20242577 986.7%48V12V100VAI100W150V/100VGaN700V 8.2939.8%121.26118.1%15.3% 202438.99%422(15V-1,200V)3.030%IDM 2025 Weiwei Luo 2024AI2024 8IDM 15V1,200V (650V/700V/900V/1,200V) 900V1,200VV-GaN1,200V700V2025AI 700V202412700VTO247-4L E-Mode1KW~4KW (100V/150V/200V) 100V200V100V2024100V48V (15V/30V/40V) 30V V-GaNMOS40V • •GPU650V100V48V12VAI •100V •202433.0 •2024150V100V 83.0IC3.030% 20241.3 202495% MOS126.415.3%118.1% 4712113 20242Fill the World with GaN(APEC) 20252025 3.02 2023592.739.8%2024828.52024 •2023192.187.8%2024360.82024 •2023208.734.4%2024280.5 •2023190.42024183.9 2023954.83.7%2024989.9 2023362.155.4%2024161.4202361.1%202419.5% 202365.011.2%202472.2(i)(ii) 202390.18.7%202497.9 2023247.182.6%2024451.2(i)(ii) 2023348.77.4%2024323.0(i)(ii) 2023118.929.3%202484.12024 20231,101.95.1%20241,045.7 202412311,525.020231231329.0 2024336.31,045.3176.6 202412311,923.9202312312,054.6 2024123170.52023123137.4 202312311.2202412312.5 202312310.8202412 312.0 100%2023123187.9%202412 3113.4% 202312 318.8202412 316.3 202412 31 20241231EPC2024121820241231 202412 31 202412 31171.8202312 31331.3 2023202412312024123139.8202312 3185.1 20241231 20241231 (i)(ii)202320241231 (i)(ii)(iii)(iv)(v) 202412 31 13 202427 202412311,147202412 31 WeiweiLuo5520177172024521Luo201710202011 LuoLuoLuo Luo Jay Hyung Son6320177 1720245 21Son201710202310 SonSon19878 582022115202311220245 21 2001202170098168898120217202211 19949 5320177172024521 20012017600380202060696920175 1993719998 4120221262024521 2009720124201282013720138 2004620097 4420221262024521 200392019620209 20103 4520239272024521 2008102009720097201482015120162201611202412202412 2002720078 6220245 21 19857199691997232020 (i)2021406622(ii)2023 101170(iii)2023 401486(iv)2023 1100030 (i)20151120221001786(ii)2017 122023308509(iii)20175202359009482023803948(iv)201762023500874600332(v)2018 22024801916 2013120191020198202112022720227 199612(EMBA)199571992720153200241995619912201132021720247 20245 21 20052006(Edwards Fellow)20118 20245202211 19992002 6520245 21 00981688981Chartered Semiconductor Manufacturing,Inc. 20245 21 1978198119811991INTC199142010320202202092021820219202342024820249 20201228782551 197361975101978101995122007120131220137200810201610 4120239 201272013112013112018720187 2007620126 5420244 20166 1991719975 6220211 198871998219983200392015620157 1985719887 472017220245 2006320127201272013122015420172 20036 4220201020245 2012920163PowerIntegrations,Inc.POWI20164201611SiliconLaboratories Inc.SLAB20161220193NXPSemiconductors N.V.NXPI 20077 4720231 2002620216202172022920229202212 20086 452020520205202211 20066201442014520204 2002720151 4420171120215 (FAE) 20156 5120241 2006720189600999201810202312605499 20046202412 462020043200410200411200812008120118201192021100048220226 200312 13.51B(1) 202412 31 8 20241231 2024123111434 Weiwei LuoJay Hyung Son 20267 3020267 3020267 30 (i)202452120245283.09D(ii)(iii) 20241231Weiwei LuoC.2.1 20241231 (i)3.13(1)(8)(ii)(iii)3.13 C.1.4 2024123020241231 3.10(2)3.21 (a)(b)(c)(d)(e)(f)(g) 202412 30202412 31 2024202412 31 Weiwei Luo (a)(b)(c)(d)(e)(f) 202412 30202412 31 WeiweiLuoWeiwei LuoLuo (a)(b)(c)(d)(e)(f) 202412 30202412 31 1.2.3. 202412 31 4175 29.84%70.16%50% 20241231 202412 31 10%10 51010% 59010% 1% 1%102 98boardoffice@innoscience.com (i)(ii)boardoffice@innoscience.com(iii) • ••• ISO/IEC 27001 (i)(ii) 20126 (a) (b)10%50%(c) 202412313.2915202412 302025153.29 202412 31 Weiwei LuoJay Hyung Son IDM8 OEM202412319641.4%22.0% ISO9001IATF169492024123141.80%12.82% 5% 4 81 26(d) 202412 31 202412 3126 202412 31 202412 3111 202412 3122 202412 31 20241231202412 31 202412 30202412 31 20241231202512249.5 50,559,3425.75% 20244 7 71,678,7608.14% (i)(ii)(iii) 75%25%25% (i)(ii)(iii) 20241231202412 31 202412 31XVXV78352 (1)L(2)202412 31389,559,466H489,592,787879,152,253(3)Luo(i) Inno Holding(ii)(iii) Inno HK(iv)(v)LuoInnoHoldingInno HK96,300,98596,300,986H(4)LuoSon2024101520241124LuoSon20211015SonLuoInno HoldingLuoSon202411 24SonLuoInno HoldingSonInno HoldingInno HoldingSonLuoInnoHolding 202412 31XVXV78352 20241231XV23336 (1)L(2)202412 31389,559,466H